Comparison between the optical properties of TiO2 and ZnO thin films deposited using Dc plasma sputtering and pulsed laser deposition
A. A. Salih ,, M. H. Makled, T. Y. Elrsasi, M. A. Hassoba, G. A. Al-Dahash
TiO2 and ZnO thin films were deposited using two different techniques, DC magnetron plasma sputtering and pulsed laser deposition, on glass substrates at different powers. The optical properties concerning the absorption, reflection and transmission spectra were studied for the deposited thin films. Noticeable enhancement for all optical properties was noticed for PLD thin films. The surface morphology of the deposits materials has been studied using atomic force microscope (AFM). The average surface roughness increasing from 3 by sputtering to 7 by PLD for TiO2 thin films and from 1 by sputtering to 9 by PLD for ZnO thin films.